The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Mar. 18, 2013
Applicant:

Basf SE, Ludwigshafen, DE;

Inventors:

Simon Braun, Mannheim, DE;

Christian Bittner, Bensheim, DE;

Andreas Klipp, Lambsheim, DE;

Assignee:

BASF SE, Ludwigshafen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/461 (2006.01); G03F 7/42 (2006.01); H01L 21/311 (2006.01); C11D 7/50 (2006.01); C11D 11/00 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); H01L 21/265 (2006.01); H01L 21/266 (2006.01); H01L 29/16 (2006.01); H01L 29/161 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
G03F 7/426 (2013.01); C11D 7/5004 (2013.01); C11D 7/5009 (2013.01); C11D 11/0047 (2013.01); G03F 7/425 (2013.01); H01L 21/02057 (2013.01); H01L 21/0271 (2013.01); H01L 21/266 (2013.01); H01L 21/26513 (2013.01); H01L 21/31133 (2013.01); H01L 29/16 (2013.01); H01L 29/161 (2013.01); H01L 29/66477 (2013.01); C11D 7/5013 (2013.01); C11D 7/5022 (2013.01);
Abstract

A photoresist stripping and cleaning composition free from N-alkylpyrrolidones and added quaternary ammonium hydroxides comprising a component (A) which comprises the polar organic solvents N-methylimidazole, dimethylsulfoxide and 1-aminopropane-2-ol.


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