The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Nov. 19, 2012
Applicants:

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

The Texas A&m University System, College Station, TX (US);

Inventors:

Sangho Cho, Bryan, TX (US);

Guorong Sun, Bryan, TX (US);

Karen L. Wooley, College Station, TX (US);

James W. Thackeray, Braintree, MA (US);

Peter Trefonas, III, Medway, MA (US);

Assignees:

THE TEXAS A&M UNIVERSITY SYSTEM, College Station, TX (US);

ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/075 (2006.01); G03F 7/16 (2006.01); G03F 7/30 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); G03F 7/0042 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0048 (2013.01); G03F 7/038 (2013.01); G03F 7/0387 (2013.01); G03F 7/075 (2013.01); G03F 7/0757 (2013.01); G03F 7/168 (2013.01);
Abstract

Disclosed herein is a composition comprising a graft block copolymer comprising a copolymer comprising a backbone polymer; and a first graft polymer that comprises a surface energy reducing moiety; the first graft polymer being grafted onto the backbone polymer; where the surface energy reducing moiety comprises a fluorine atom, a silicon atom, or a combination of a fluorine atom and a silicon atom; a photoacid generator; and a crosslinking agent.


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