The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 22, 2015

Filed:

Jun. 27, 2014
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Harry-Hak Lay Chuang, Cresent, SG;

Ming Zhu, Woodlands, SG;

Hui Wen Lin, Taiping, TW;

Bao Ru Young, Zhubei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01); H01L 29/49 (2006.01); H01L 21/8238 (2006.01); H01L 29/51 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 27/092 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4966 (2013.01); H01L 21/823842 (2013.01); H01L 27/092 (2013.01); H01L 29/517 (2013.01); H01L 29/66545 (2013.01); H01L 29/78 (2013.01);
Abstract

A semiconductor device including a first gate structure associated with a first type of transistor and a second gate structure of a second type of transistor. The first gate structure includes a capping layer, a first metal layer having a first type of work function on the capping layer, and a second metal layer having a second type of work function, overlying the first metal layer and a fill layer on the second metal layer. The second type of work function is different than the first type of work function. The second gate structure includes the gate dielectric and the second metal layer formed on the gate dielectric, and the fill layer on the second metal layer.


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