The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2015
Filed:
Aug. 26, 2009
Hidenori Takahashi, Shizuoka, JP;
Tomotaka Tsuchimura, Shizuoka, JP;
Toru Tsuchihashi, Shizuoka, JP;
Katsuhiro Yamashita, Shizuoka, JP;
Naoyuki Nishikawa, Kanagawa, JP;
Hidenori Takahashi, Shizuoka, JP;
Tomotaka Tsuchimura, Shizuoka, JP;
Toru Tsuchihashi, Shizuoka, JP;
Katsuhiro Yamashita, Shizuoka, JP;
Naoyuki Nishikawa, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.