The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2015

Filed:

Mar. 07, 2013
Applicant:

Great Power Semiconductor Corp., New Taipei, TW;

Inventor:

Chun-Ying Yeh, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66666 (2013.01); H01L 29/4236 (2013.01); H01L 29/7827 (2013.01);
Abstract

A trenched power semiconductor device with enhanced breakdown voltage is provided. The trenched power semiconductor device has a first trench penetrating the body region located between two neighboring gate trenches. A polysilicon structure with a conductivity type identical to that of the body region is located in a lower portion of the first trench and spaced from the body region with a predetermined distance. A dielectric structure is located on the polysilicon structure and at least extended to the body region. Source regions are located in an upper portion of the body region. A heavily doped region located in the body region is extended to the bottom of the body region. A conductive structure is electrically connected to the heavily doped region and the source region.


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