The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2015
Filed:
Aug. 25, 2009
Applicants:
Tsutomu Sahoda, Kawasaki, JP;
Futoshi Shimai, Kawasaki, JP;
Akihiko Sato, Kawasaki, JP;
Inventors:
Assignee:
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 13/02 (2006.01); H01L 21/677 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67778 (2013.01); H01L 21/67051 (2013.01); H01L 21/67161 (2013.01); H01L 21/67724 (2013.01); H01L 21/67733 (2013.01); H01L 21/67736 (2013.01); H01L 21/67742 (2013.01); H01L 21/67766 (2013.01); B05C 13/02 (2013.01); H01L 21/67196 (2013.01); H01L 21/67751 (2013.01);
Abstract
A substrate processing system includes a processing unit, a substrate loading unit, a substrate unloading unit, and a carrying unit. A carrying device has a constitution in which a suction portion suctioning and holding a substrate is rotatable about an arm portion provided in a base portion and the substrate is rotated in the state where the substrate is held by a holding portion. A coating device has a constitution in which a liquid material is ejected from a nozzle to both surfaces of the substrate rotating in an upright state.