The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2015

Filed:

Feb. 05, 2014
Applicant:

Ebara Corporation, Tokyo, JP;

Inventor:

Toshikazu Kawahara, Tokyo, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/005 (2012.01); B24B 49/08 (2006.01); B24B 37/34 (2012.01); B24B 37/10 (2012.01);
U.S. Cl.
CPC ...
B24B 37/345 (2013.01); B24B 37/005 (2013.01); B24B 37/105 (2013.01); B24B 49/08 (2013.01);
Abstract

An object of the present invention is to improve the capability of lifting a substrate with the polishing performance of the substrate maintained. A polishing apparatusincludes a polishing tableto which a polishing padfor polishing a substrateis attached, a liquid feeding section configured to feed a liquidto a polishing surface of the polishing pad, a top ringconfigured to suck and convey the substratefrom the polishing surface, the substratebeing disposed on the polishing surface via the liquidfed by the liquid feeding section, and a control section configured to inject a fluid (N) into an internal areaof the liquidinterposed between the substrateand the polishing pad


Find Patent Forward Citations

Loading…