The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 15, 2015

Filed:

Dec. 28, 2005
Applicants:

Islam A. Salama, Chandler, AZ (US);

Nathaniel R. Quick, Lake Mary, FL (US);

Aravinda Kar, Oviedo, FL (US);

Inventors:

Islam A. Salama, Chandler, AZ (US);

Nathaniel R. Quick, Lake Mary, FL (US);

Aravinda Kar, Oviedo, FL (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/00 (2014.01); B23K 26/38 (2014.01); B23K 26/073 (2006.01); H01L 21/311 (2006.01); H05K 3/00 (2006.01); B23K 26/40 (2014.01);
U.S. Cl.
CPC ...
B23K 26/381 (2013.01); B23K 26/0734 (2013.01); B23K 26/382 (2015.10); B23K 26/385 (2013.01); B23K 26/403 (2013.01); B23K 26/408 (2013.01); H01L 21/31138 (2013.01); H05K 3/0026 (2013.01); B23K 2201/40 (2013.01);
Abstract

A method includes generating a laser beam and applying the beam to a substrate to form a via in the substrate. The laser beam has an intensity profile taken at a cross-section transverse to the direction of propagation of the beam. The intensity profile has a first substantially uniform level across an interior region of the cross-section and a second substantially uniform level across an exterior region of the cross-section. The second intensity level is greater than the first intensity level.


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