The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2015
Filed:
Apr. 24, 2015
Korea Institute of Machinery & Materials, Daejeon, KR;
KOREA INSTITUTE OF MACHINERY & MATERIALS, Daejeon, KR;
Abstract
A plasma reactor for abating hazardous materials by decomposing various hazardous materials in a front end part of a vacuum pump is provided. A plasma reactor for abating hazardous materials includes a ground electrode part, an insulator, and a driving electrode. The ground electrode part includes a first ground electrode located in a front end part of the vacuum pump and having a tubular shape, including a first end part facing the vacuum pump and a second end part at an opposite side thereof, and a second ground electrode connected to a side of the first ground electrode and having a tubular shape and transferring the process gas. The insulator is connectedly installed to the second end part. The driving electrode is fixed to an outer surface of the insulator, a driving voltage is applied while being connected to a power supply, and low pressure plasma is generated inside of the first ground electrode due to a voltage difference from the ground electrode part.