The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
May. 22, 2012
Hirokazu Tamaki, Tokyo, JP;
Yoshio Takahashi, Tokyo, JP;
Hiroto Kasai, Tokyo, JP;
Hiroyuki Kobayashi, Tokyo, JP;
Hirokazu Tamaki, Tokyo, JP;
Yoshio Takahashi, Tokyo, JP;
Hiroto Kasai, Tokyo, JP;
Hiroyuki Kobayashi, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings () connected into a single opening, and multiple electrodes () arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes () are configured such that a voltage application layer () comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (), and of ameliorating the problem of anisotropic potential distributions.