The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2015

Filed:

Mar. 05, 2013
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Markus Hauf, Ulm, DE;

Norman Baer, Aalen, DE;

Holger Walter, Abtsgmuend, DE;

Joachim Hartjes, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 7/18 (2006.01); G01J 5/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70058 (2013.01); G01J 5/02 (2013.01); G02B 7/181 (2013.01); G02B 7/1815 (2013.01); G03F 7/70266 (2013.01); G03F 7/70891 (2013.01);
Abstract

The disclosure concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus. The mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface. The arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror via electromagnetic radiation which is propagated along the access passage. The electromagnetic radiation is reflected a plurality of times within the access passage.


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