The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2015

Filed:

Mar. 29, 2013
Applicant:

V Technology Co., Ltd., Kanagawa-ken, JP;

Inventors:

Koichi Kajiyama, Kanagawa, JP;

Kazushige Hashimoto, Kanagawa, JP;

Toshinari Arai, Kanagawa, JP;

Assignee:

V TECHNOLOGY CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1337 (2006.01); G03F 7/20 (2006.01); G02F 1/13 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133788 (2013.01); G02F 1/1303 (2013.01); G02F 1/133753 (2013.01); G03F 7/201 (2013.01); G03F 7/70275 (2013.01); G03F 7/70283 (2013.01); G03F 7/70308 (2013.01); G03F 7/70325 (2013.01); G03F 7/70358 (2013.01); G02F 2001/133757 (2013.01);
Abstract

A photo-alignment exposure device that includes a first mask and a first exposure device that independently proximity-exposes a first divided area, a second mask and a second exposure device that independently proximity-exposes a second divided area adjacent to the first divided area, and a third mask and a third exposure device that exposes an area on a side of the first divided area near a boundary between the first divided area and the second divided area. The third exposure device is provided with a photo-irradiation angle same as that of the first exposure device or the second exposure device with respect to an exposed surface. A condensing element that condenses the mask transmitted light on the area on a side of the first divided area near the boundary is provided between the mask opening of the third mask and the exposed surface.


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