The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 2015

Filed:

Mar. 14, 2013
Applicant:

Cymer, Llc, San Diego, CA (US);

Inventors:

Rostislav Rokitski, La Jolla, CA (US);

Nakgeuon Seong, San Diego, CA (US);

Kevin O'Brien, San Diego, CA (US);

Assignee:

Cymer, LLC, San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 3/46 (2006.01); G01J 3/28 (2006.01); G03F 7/20 (2006.01); G01J 3/18 (2006.01); G01J 11/00 (2006.01); G01J 3/02 (2006.01); G01J 1/42 (2006.01); G01J 9/00 (2006.01);
U.S. Cl.
CPC ...
G01J 3/28 (2013.01); G01J 3/027 (2013.01); G01J 3/1809 (2013.01); G01J 11/00 (2013.01); G03F 7/7085 (2013.01); G03F 7/70091 (2013.01); G03F 7/70575 (2013.01); G01J 2001/4238 (2013.01); G01J 2009/006 (2013.01);
Abstract

A spectral feature of a pulsed light beam produced by an optical source is estimated by modifying the wavelength of the pulsed light beam based on a predefined repeating pattern having a pattern period including a plurality of steps, the modification including shifting the wavelength of the pulsed light beam by a wavelength offset from a baseline wavelength for each step in the pattern period; measuring the wavelength of the light beam for each step in the pattern period as the wavelength is modified across the pattern; and estimating a spectral feature of the pulsed light beam over an evaluation window that includes all of the steps within the pattern period based at least in part on the measured wavelength of the light beam for each step in the pattern period.


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