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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9202691 B1

PDFFull Text
Date of Patent:
Dec. 01, 2015

Filed:

Jan. 18, 2013

Semiconductor device having modified profile metal gate

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Yu-Lien Huang, Jhubei, TW;

Chi-Wen Liu, Hsinchu, TW;

Zhao-Cheng Chen, New Taipei, TW;

Ming-Huan Tsai, Zhubei, TW;

Clement Hsingjen Wann, Carmel, NY (US);

Assignee:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Attorney:

Haynes and Boone, LLP

Primary Examiner:

Julio J Maldonado

Assistant Examiner:

Rodolfo Fortich

Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 21/02 (2006.01); H01L 29/49 (2006.01); H01L 29/66 (2006.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02697 (2013.01); H01L 29/4966 (2013.01); H01L 29/66545 (2013.01); H01L 29/78 (2013.01); H01L 29/517 (2013.01); H01L 29/7833 (2013.01);
Abstract

In one embodiment, a method includes providing a semiconductor substrate having a trench disposed thereon and forming a plurality of layers in the trench. The plurality of layers formed in the trench is etched thereby providing at least one etched layer having a top surface that lies below a top surface of the trench. In a further embodiment, this may provide for a substantially v-shaped opening or entry to the trench for the formation of further layers.

Find Patent Forward Citations

Huang, Yu-Lien. (2015). Semiconductor device having modified profile metal gate (U.S. Patent No. 9202691). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9202691

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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