The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 01, 2015

Filed:

Sep. 03, 2009
Applicants:

Jiang-tao Dang, Shanghai, CN;

Ningning Pan, Shanghai, CN;

Haijun Gao, Shanghai, CN;

Inventors:

Jiang-tao Dang, Shanghai, CN;

Ningning Pan, Shanghai, CN;

Haijun Gao, Shanghai, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/21 (2006.01); G01N 21/27 (2006.01);
U.S. Cl.
CPC ...
G01N 21/211 (2013.01); G01N 21/274 (2013.01);
Abstract

Methods and systems are provided to avoid the rotation action with the polarizer and the analyzer in complex ellipsometric measurement and repeated processes. In particular, methods and systems are provided which polarize the incident light in a fixed azimuthal angle then illuminate the polarized light onto the target surface, analyze the surface polarized characteristics light in a fixed azimuthal angle, and obtain the light intensity and phase information corresponding to the target surface. Then, based on the relationship between the characteristic information detected by electromagnetic wave and the light intensity information, the disclosed methods and systems obtain the characteristic information of the target surface.


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