The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2015

Filed:

Dec. 19, 2013
Applicant:

Renesas Electronics Corporation, Kawasaki-shi, JP;

Inventors:

Tomohiro Hirai, Kawasaki, JP;

Shogo Mochizuki, Kawasaki, JP;

Toshiharu Nagumo, Kawasaki, JP;

Assignee:

Renesas Electronics Corporation, Kawasaki-shi, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/775 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/778 (2006.01); B82Y 10/00 (2011.01); H01L 29/786 (2006.01); H01L 29/49 (2006.01);
U.S. Cl.
CPC ...
H01L 29/775 (2013.01); B82Y 10/00 (2013.01); H01L 29/0649 (2013.01); H01L 29/66439 (2013.01); H01L 29/66477 (2013.01); H01L 29/778 (2013.01); H01L 29/7848 (2013.01); H01L 29/78684 (2013.01); H01L 29/0673 (2013.01); H01L 29/4958 (2013.01);
Abstract

A semiconductor device includes a channel structure formed on a substrate, the channel structure being formed of a semiconductor material. A gate structure covers at least a portion of the surface of the channel structure and is formed of a film of insulation material and a gate electrode. A source structure is connected to one end of the channel structure, and a drain structure is connected to the other end of the channel structure. The channel structure has a non-uniform composition, in a cross-sectional view, that provides a reduction of a leakage current of the semiconductor device relative to a leakage current that would result from a uniform composition.


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