The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Apr. 03, 2012
Applicants:
Kai Cheng, Leuven, BE;
Matty Caymax, Leuven, BE;
Inventors:
Kai Cheng, Leuven, BE;
Matty Caymax, Leuven, BE;
Assignee:
IMEC, Leuven, BE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/02 (2006.01); H01L 21/02 (2006.01); H01L 33/00 (2010.01); H01L 33/06 (2010.01);
U.S. Cl.
CPC ...
H01L 21/02494 (2013.01); H01L 21/0237 (2013.01); H01L 21/0243 (2013.01); H01L 21/0254 (2013.01); H01L 21/02381 (2013.01); H01L 21/02458 (2013.01); H01L 21/02505 (2013.01); H01L 21/02516 (2013.01); H01L 21/02587 (2013.01); H01L 33/007 (2013.01); H01L 33/06 (2013.01);
Abstract
A semiconductor device and a method of manufacturing the device is disclosed. In one aspect, a method includes providing a substrate, providing a first epitaxial semiconducting layer on top of the substrate, and forming a one- or two-dimensional repetitive pattern, each part of the pattern having an aspect ratio in the range of about 0.1 to 50.