The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Aug. 16, 2012
Qixin Xu, Shanghai, CN;
Fan Wang, Shanghai, CN;
SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD., Shanghai, CN;
Abstract
An interference exposure device, including: a light source () for providing an exposure light beam; a light homogenizer-collimator () for homogenizing and collimating the exposure light beam; an interference unit () including at least two gratings () for converting the exposure light beam into at least two coherent light beams and making the coherent light beams converge on a substrate surface to form thereon an interference exposure pattern, the gratings () each having a period and being distributed in correspondence with a desired exposure pattern; a driving and supporting means () for supporting and carrying the substrate to move with at least three degrees of freedom; and a measuring element () for measuring an angle between coordinate systems of the interference unit () and the means () to adjust an exposure position of the means () based on a measurement result of the measuring element () before exposing the substrate.