The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2015

Filed:

Nov. 24, 2014
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventor:

Kei Shimura, Mito, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/42 (2006.01); G01N 21/33 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); G01N 21/94 (2006.01); G01N 21/47 (2006.01);
U.S. Cl.
CPC ...
G01N 21/33 (2013.01); G01N 21/47 (2013.01); G01N 21/94 (2013.01); G01N 21/95 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G01N 21/95684 (2013.01); G01N 2201/0697 (2013.01); G01N 2201/06113 (2013.01);
Abstract

Method for realizing an inspection with short wavelength, high power light source and large numerical aperture, high performance optics to improve defect inspection sensitivity is disclosed. Short wavelength high power laser is realized by using a pulse oscillation type laser suitable for generation of high output power in a short-wavelength region. In addition, a spectral bandwidth of the laser is narrowed down so that amount of chromatic aberration of detection optics with single glass material (i.e. without compensation of chromatic aberration) is lowered to permissible level. Using highly workable glass material to construct the detection optics enables necessary surface accuracy or profile irregularity conditions to be met, even if the number of lenses is increased for large NA or the lens doesn't have a rotationally symmetrical aperture.


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