The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Aug. 06, 2012
Applicants:
Isao Hirano, Kawasak, JP;
Kimihisa Yamamoto, Tokyo, JP;
Takane Imaoka, Tokyo, JP;
Inventors:
Assignees:
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
TOKYO INSTITUTE OF TECHNOLOGY, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/02 (2006.01); B23B 3/14 (2006.01); C08G 83/00 (2006.01); B32B 3/00 (2006.01); B82Y 30/00 (2011.01); C09D 201/00 (2006.01);
U.S. Cl.
CPC ...
B23B 3/14 (2013.01); B05D 1/02 (2013.01); B32B 3/00 (2013.01); B82Y 30/00 (2013.01); C08G 83/002 (2013.01); C08G 83/003 (2013.01); C09D 201/005 (2013.01); Y10T 428/24372 (2015.01);
Abstract
A method for producing a substrate having dispersed particles of a dendrimer compound on the surface thereof, the method including: an application step including dissolving a phenyl azomethine dendrimer compound in a solvent to prepare a solution, and applying the solution on the surface of a substrate; and a volatilization step including volatilizing the solvent from the solution applied on the surface of the substrate, the phenyl azomethine dendrimer compound included in the solution having a concentration of no greater than 5 μmol/L is employed.