The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 24, 2015

Filed:

Jan. 07, 2010
Applicants:

Yutaka Mikawa, Ushiku, JP;

Makiko Kiyomi, Ushiku, JP;

Yuji Kagamitani, Sendai, JP;

Toru Ishiguro, Sendai, JP;

Inventors:

Yutaka Mikawa, Ushiku, JP;

Makiko Kiyomi, Ushiku, JP;

Yuji Kagamitani, Sendai, JP;

Toru Ishiguro, Sendai, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/02 (2006.01); C30B 7/10 (2006.01); C30B 29/40 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
B01J 19/02 (2013.01); C30B 7/105 (2013.01); C30B 29/403 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01); H01L 21/02389 (2013.01); H01L 21/02425 (2013.01); H01L 21/02433 (2013.01); B01J 2219/0236 (2013.01); Y10T 117/1096 (2015.01);
Abstract

To grow a highly pure nitride crystal having a low oxygen concentration efficiently by an ammonothermal method. A process for producing a nitride crystal, which comprises bringing a reactant gas reactive with ammonia to form a mineralizer, and ammonia into contact with each other to prepare a mineralizer in a reactor or in a closed circuit connected to a reactor; and growing a nitride crystal by an ammonothermal method in the presence of the ammonia and the mineralizer.


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