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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9188858 B1

PDFFull Text
Date of Patent:
Nov. 17, 2015

Filed:

Sep. 26, 2012

Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound

Applicant:

Jsr Corporation, Tokyo, JP;

Inventor:

Yusuke Asano, Tokyo, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Cynthia H Kelly

Assistant Examiner:

Alyssa L Cepluch

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 309/19 (2006.01); C07C 309/12 (2006.01); C07C 381/12 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01); C07C 309/07 (2006.01); C07C 309/16 (2006.01); C07C 309/17 (2006.01); C07C 309/65 (2006.01); C07C 317/12 (2006.01); C07D 295/185 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/07 (2013.01); C07C 309/12 (2013.01); C07C 309/16 (2013.01); C07C 309/17 (2013.01); C07C 309/19 (2013.01); C07C 309/65 (2013.01); C07C 317/12 (2013.01); C07C 381/12 (2013.01); C07D 295/185 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/2041 (2013.01); C07C 2101/14 (2013.01); C07C 2102/42 (2013.01); C07C 2103/74 (2013.01);
Abstract

A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), Rrepresents a monovalent organic group having 1 to 20 carbon atoms. Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), Ris as defined in the above formula (1). X represents an electron attractive group. Rrepresents a monovalent organic group having 1 to 20 carbon atoms.

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Asano, Yusuke. (2015). Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound (U.S. Patent No. 9188858). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9188858

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