The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2015
Filed:
Jul. 06, 2012
Marcus Adrianus Van DE Kerkhof, Helmond, NL;
Siebe Landheer, Eindhoven, NL;
Marcel Beckers, Eindhoven, NL;
Jeroen Peter Johannes Bruijstens, Eindhoven, NL;
Ivo Adam Johannes Thomas, Son, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Siebe Landheer, Eindhoven, NL;
Marcel Beckers, Eindhoven, NL;
Jeroen Peter Johannes Bruijstens, Eindhoven, NL;
Ivo Adam Johannes Thomas, Son, NL;
Franciscus Johannes Joseph Janssen, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.