The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2015

Filed:

Jan. 17, 2014
Applicant:

Gigaphoton Inc., Oyama, Tochigi, JP;

Inventors:

Yukio Watanabe, Hiratsuka, JP;

Osamu Wakabayashi, Hiratsuka, JP;

Miwa Igarashi, Oyama, JP;

Assignee:

Gigaphoton Inc., Tochigi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); G03F 7/20 (2006.01); G21K 1/04 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); G03F 7/70033 (2013.01); G03F 7/70916 (2013.01); G21K 1/04 (2013.01); H05G 2/003 (2013.01); H05G 2/005 (2013.01);
Abstract

An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.


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