The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2015

Filed:

Sep. 26, 2013
Applicant:

Renesas Electronics Corporation, Kawasaki-shi, Kanagawa, JP;

Inventors:

Hiroshi Takeda, Kanagawa, JP;

Kiyoshi Takeuchi, Kanagawa, JP;

Takashi Onizawa, Kanagawa, JP;

Masayasu Tanaka, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/872 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/778 (2006.01); H01L 27/06 (2006.01); H01L 29/40 (2006.01); H01L 29/45 (2006.01); H01L 29/49 (2006.01); H01L 29/20 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7833 (2013.01); H01L 27/0629 (2013.01); H01L 29/0619 (2013.01); H01L 29/0847 (2013.01); H01L 29/66143 (2013.01); H01L 29/66462 (2013.01); H01L 29/66659 (2013.01); H01L 29/7786 (2013.01); H01L 29/7835 (2013.01); H01L 29/872 (2013.01); H01L 29/0634 (2013.01); H01L 29/2003 (2013.01); H01L 29/402 (2013.01); H01L 29/4236 (2013.01); H01L 29/456 (2013.01); H01L 29/4933 (2013.01);
Abstract

A first contact, a second impurity region, and a second low-concentration impurity region form a Schottky barrier diode. The second impurity region has the same impurity concentration as those of first impurity regions, and thus can be formed in the same process as forming the first impurity regions. In addition, the second low-concentration impurity region has the same impurity concentration as those of first low-concentration impurity regions, and thus can be formed in the same process as forming the first low-concentration impurity regions.


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