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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9177839 B1

PDFFull Text
Date of Patent:
Nov. 03, 2015

Filed:

Mar. 06, 2009

Cover part, process gas diffusing and supplying unit, and substrate processing apparatus

Applicant:

Toshifumi Ishida, Nirasaki, JP;

Inventor:

Toshifumi Ishida, Nirasaki, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Rakesh Dhingra

Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01); H01J 37/32 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); C23C 16/45565 (2013.01); H01J 37/3244 (2013.01); H01J 37/32449 (2013.01);
Abstract

A processing gas diffusing and supplying unit includes a supporting portion having an opening, a plate including gas supply holes, an internal space, between the supporting portion and the plate, communicating with the opening, and a cover part installed within the internal space and connected to the opening. The cover part includes a shielding portion which is disposed within the internal space and has a surface facing the opening, a side wall which holds the shielding portion, and a through hole formed at the side wall and communicating with the opening and the internal space. At least a portion of the gas supply holes is located right below the cover part and a height of the internal space is equal to or greater than 8 mm.

Find Patent Forward Citations

Ishida, Toshifumi. (2015). Cover part, process gas diffusing and supplying unit, and substrate processing apparatus (U.S. Patent No. 9177839). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9177839

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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