The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2015

Filed:

Jan. 21, 2014
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Wei-Chieh Huang, Zhudong Township, TW;

Hung Chang Hsieh, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/30 (2006.01); H01L 21/67 (2006.01); B05C 11/08 (2006.01); B05C 13/00 (2006.01); B05C 9/12 (2006.01); B05C 11/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/3021 (2013.01); B05C 9/12 (2013.01); B05C 11/023 (2013.01); B05C 11/08 (2013.01); H01L 21/67017 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); B05C 11/02 (2013.01); B05C 13/00 (2013.01); H01L 21/6715 (2013.01);
Abstract

The present disclosure provides a method of fabricating a semiconductor device. The method includes dispensing a liquid on a wafer. The method includes raising the wafer. The method includes lowering the wafer after the raising. The wafer is spun as it is lowered, thereby removing at least a portion of the liquid from the wafer. The present disclosure also provides an apparatus for fabricating a semiconductor device. The apparatus includes a wafer chuck that is operable to hold a semiconductor wafer and secure the wafer thereto. The wafer has a front surface and a back surface. The apparatus includes a dispenser that is operable to dispense a liquid to the front surface of the wafer. The apparatus includes a mechanical structure that is operable to: spin the wafer chuck in a horizontal direction; and move the wafer chuck downwards in a vertical direction while the wafer chuck is being rotated.


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