The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2015
Filed:
Oct. 25, 2011
Hong Sheng Yang, Pleasanton, CA (US);
Tony P. Chiang, Campbell, CA (US);
Kent Riley Child, Dublin, CA (US);
Chi-i Lang, Cupertino, CA (US);
Shouqian Shao, Fremont, CA (US);
Hong Sheng Yang, Pleasanton, CA (US);
Tony P. Chiang, Campbell, CA (US);
Kent Riley Child, Dublin, CA (US);
Chi-I Lang, Cupertino, CA (US);
ShouQian Shao, Fremont, CA (US);
Intermolecular, Inc., San Jose, CA (US);
Abstract
In one aspect of the invention, a process chamber is provided. The chamber includes a plurality of sputter guns with a target affixed to one end of each of the sputter guns. Each of the plurality of sputter guns is coupled to a first power source. The first power source is operable to provide a pulsed power supply to each of the plurality of sputter guns. The pulsed power supply has a duty cycle that is less than 30%. A substrate support disposed at a distance from the plurality of sputter guns is included. The substrate support is coupled to a second power source. The second power source is operable to bias a substrate disposed on the substrate support, wherein the duty cycle of the second power source is synchronized with a duty cycle of the first power source. A method of performing a deposition process is also included.