The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2015
Filed:
Dec. 27, 2010
Applicant:
Ming Fang, Plano, TX (US);
Inventor:
Ming Fang, Plano, TX (US);
Assignee:
STMicroelectronics, Inc., Coppell, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81B 7/00 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
B81B 7/0029 (2013.01); B81C 1/0019 (2013.01); B81B 2203/0181 (2013.01); B81C 2201/112 (2013.01);
Abstract
A method of manufacturing microstructures, such as MEMS or NEMS devices, including forming a protective layer on a surface of a moveable component of the microstructure. For example, a silicide layer may be formed on one or more surfaces of a poly-silicon mass that is moveable with respect to a substrate of the microstructure. The process may be self-aligning.
Quick Actions:
Fang, Ming. (2015). Microstructure and electronic device (U.S. Patent No. 9174835). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9174835
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile