The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Nov. 22, 2013
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Thomas Walter Dyer, Pleasant Valley, NY (US);
Herbert Lei Ho, New Windsor, NY (US);
Jin Liu, Chappaqua, NY (US);
Assignee:
GLOBALFOUNDRIES, INC., Grand Cayman, KY;
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/00 (2006.01); H01L 27/108 (2006.01); H01L 21/762 (2006.01); H01L 27/12 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/10829 (2013.01); H01L 21/76224 (2013.01); H01L 27/1087 (2013.01); H01L 27/1203 (2013.01); H01L 28/91 (2013.01);
Abstract
An integrated circuit structure provides at least one metal-insulator-metal (MIM) capacitor and a moat isolation structure wherein the number of processes required is substantially minimized and the formation of the MIM capacitor and the moat isolation structure effectively decouple while the number of processes common to the moat isolation structure and the MIM capacitor are maximized. Additional required processes are non-critical and tolerant of overlay positioning error.