The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Jan. 24, 2012
Applicants:
David N. Ruzic, Pesotum, IL (US);
John R. Sporre, Albany, NY (US);
Inventors:
David N. Ruzic, Pesotum, IL (US);
John R. Sporre, Albany, NY (US);
Assignee:
The Board of Trustees of the University of Illinois, Urbana, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); G01B 11/00 (2006.01); C03C 15/00 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); H01L 29/66818 (2013.01);
Abstract
A method of selectively etching a three-dimensional (3-D) structure includes generating a plasma in contact with the 3-D structure, and illuminating a designated portion of the 3-D structure with a laser beam while the plasma is being generated. Nonilluminated portions of the 3-D structure are etched at a first etch rate, and the designated portion of the 3-D structure is etched at a second etch rate, where the second etch rate is different from the first etch rate.