The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Jan. 19, 2013
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Deyan Wang, Hudson, MA (US);
Peter Trefonas, III, Medway, MA (US);
Jieqian Zhang, Southborough, MA (US);
Peng-Wei Chuang, Natick, MA (US);
Assignee:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); B05D 1/00 (2006.01); B05D 1/26 (2006.01); B05D 1/28 (2006.01); B05D 1/30 (2006.01); B05D 1/02 (2006.01); B05D 1/18 (2006.01); B05D 3/02 (2006.01); B05D 7/16 (2006.01); H01L 21/033 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0271 (2013.01); B05D 1/005 (2013.01); B05D 1/02 (2013.01); B05D 1/18 (2013.01); B05D 1/26 (2013.01); B05D 1/28 (2013.01); B05D 1/30 (2013.01); B05D 3/02 (2013.01); B05D 7/16 (2013.01); H01L 21/0332 (2013.01); H01L 21/3105 (2013.01);
Abstract
Methods of treating the surface of a metal-containing hardmask used in the manufacture of semiconductors by contacting the hardmask surface with a composition capable of adjusting the water contact angle so as to substantially match that of subsequently applied organic coatings are provided.