The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Mar. 05, 2013
Asml Netherlands B.v., Veldhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Wilhelmus Petrus De Boeij, Veldhoven, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Michel François Hubert Klaassen, Eindhoven, NL;
Martijn Gerard Dominique Wehrens, Waalre, NL;
Haico Victor Kok, Eindhoven, NL;
Wilhelmus Jacobus Maria Rooijakkers, Eindhoven, NL;
Tammo Uitterdijk, De Bilt, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system, support constructed to support patterning device, a projection system, an interferometric sensor and a detector. The interferometric sensor is designed to measure one or more wavefronts of a radiation beam projected by the projection system from an adjustable polarizer. The interferometric sensor includes a diffractive element disposed at a level of a substrate in the lithographic apparatus and a detector spaced apart from the diffractive element, the diffractive element being arranged to provide shearing interferometry between at least two wavefronts mutually displaced in a direction of shear. The detector is designed to determine, from the wavefront measurements, information on polarization affecting properties of the projection system.