The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Mar. 16, 2010
Gang He, Cupertino, CA (US);
Gregg Higashi, San Jose, CA (US);
Khurshed Sorabji, San Jose, CA (US);
Roger Hamamjy, San Jose, CA (US);
Andreas Hegedus, Burlingame, CA (US);
Gang He, Cupertino, CA (US);
Gregg Higashi, San Jose, CA (US);
Khurshed Sorabji, San Jose, CA (US);
Roger Hamamjy, San Jose, CA (US);
Andreas Hegedus, Burlingame, CA (US);
Alta Devices, Inc., Sunnyvale, CA (US);
Abstract
Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may independently contain quartz, and in some examples, may be fused together.