The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Jun. 08, 2011
Masanori Sakai, Takaoka, JP;
Nobuhito Shima, Imizu, JP;
Kazuyuki Okuda, Toyama, JP;
HITACHI KOKUSAI ELECTRIC INC., Tokyo, JP;
Abstract
A substrate processing device comprises a reaction vesselforming a space receiving a substrateand adapted to have a plurality of reaction gases supplied thereto to perform desired processing of the substrate, an exhaust portformed in the reaction vesselfor exhausting the reaction vessel, and a gas supply systemA,B for supplying at least a plurality of reaction gases into the reaction vessel, the gas supply systemA,B including a cleaning gas supply unit for supplying a cleaning gas to perform desired processing of the substrateto thereby remove adherents in the reaction vessel, and a post-processing gas supply unit for supplying a post-processing gas capable of removing the elements contained in the cleaning gas remaining in the reaction vesselafter the adherents have been removed by supplying the cleaning gas, the post-processing gas containing all of the reaction gases used in performing desired processing of the substrate.