The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2015

Filed:

Aug. 16, 2012
Applicants:

Wei-chien Chen, Taichung, TW;

Lung-teng Cheng, Changhua County, TW;

Ding-wen Chiou, Taipei, TW;

Tung-po Hsieh, Taipei, TW;

Inventors:

Wei-Chien Chen, Taichung, TW;

Lung-Teng Cheng, Changhua County, TW;

Ding-Wen Chiou, Taipei, TW;

Tung-Po Hsieh, Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/06 (2006.01); C23C 8/62 (2006.01); C23C 10/30 (2006.01); C23C 14/58 (2006.01); H01L 21/02 (2006.01); H01L 31/032 (2006.01);
U.S. Cl.
CPC ...
C23C 14/0623 (2013.01); C23C 8/62 (2013.01); C23C 10/30 (2013.01); C23C 14/5866 (2013.01); H01L 21/02422 (2013.01); H01L 21/02491 (2013.01); H01L 21/02568 (2013.01); H01L 21/02664 (2013.01); H01L 31/0322 (2013.01); Y02E 10/541 (2013.01);
Abstract

The disclosure discloses a method for modifying the light absorption layer, including: (a) providing a substrate; (b) forming a light absorption layer on the substrate, wherein the light absorption layer includes a Group IB element, Group IIIA element and Group VIA element; (c) forming a slurry on the light absorption layer, wherein the slurry includes a Group VIA element; and (d) conducting a thermal process for the light absorption layer with the slurry.


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