The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Nov. 27, 2012
Mitsubishi Materials Corporation, Tokyo, JP;
Masami Miyake, Naka-gun, JP;
Naoya Murakami, Naka-gun, JP;
MITSUBISHI MATERIALS CORPORATION, Tokyo, JP;
Abstract
An apparatus for producing trichlorosilane in which reacted gas including trichlorosilane and hydrogen chloride is produced by heating raw gas including silicon tetrachloride and hydrogen, the apparatus having: a reaction vessel having a substantially cylindrical shape and being provided with a heated wall forming a gas flow-passage along an axis direction; and a heater heating the heated wall, wherein a folding flow-passage is provided at an uppermost stream of the gas flow-passage and has: an inlet flow-passage in which raw gas is introduced; and a turning part connected to a downstream of the inlet flow-passage in which a flow direction of the raw gas is turned at least once in an opposite direction, the turning part is formed between the inlet flow-passage and the heated wall in the folding flow-passage, and a turning length of the folding flow-passage along the axis direction is smaller than a maximum length of the gas flow-passage along the axis direction.