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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9165779 B1

PDFFull Text
Date of Patent:
Oct. 20, 2015

Filed:

Mar. 11, 2015

Flat sic semiconductor substrate

Applicant:

Dow Corning Corporation, Midland, MI (US);

Inventors:

Mark Loboda, Bay City, MI (US);

Christopher Parfeniuk, Midland, MI (US);

Assignee:

DOW CORNING CORPORATION, Midland, MI (US);

Attorneys:

Nixon Peabody LLP

Joseph Bach, Esq.

Primary Examiner:

Nicholas Tobergte

Int. Cl.
CPC ...
H01L 29/15 (2006.01); H01L 21/306 (2006.01); H01L 21/02 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); H01L 21/02013 (2013.01); H01L 21/02019 (2013.01); H01L 21/02021 (2013.01); H01L 21/02035 (2013.01); H01L 29/1608 (2013.01);
Abstract

Methods for manufacturing silicon carbide wafers having superior specifications for bow, warp, total thickness variation (TTV), local thickness variation (LTV), and site front side least squares focal plane range (SFQR). The resulting SiC wafer has a mirror-like surface that is fit for epitaxial deposition of SiC. The specifications for bow, warp, total thickness variation (TTV), local thickness variation (LTV), and site front side least squares focal plane range (SFQR) of the wafer are preserved following the addition of the epitaxy layer.

Find Patent Forward Citations

Loboda, Mark. (2015). Flat sic semiconductor substrate (U.S. Patent No. 9165779). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9165779

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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