The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2015

Filed:

Sep. 23, 2011
Applicants:

Jia-yush Yen, Taipei, TW;

Yung-yaw Chen, Taipei, TW;

Yi-hung Kuo, Taipei, TW;

Cheng-ju Wu, Taipei, TW;

Inventors:

Jia-Yush Yen, Taipei, TW;

Yung-Yaw Chen, Taipei, TW;

Yi-Hung Kuo, Taipei, TW;

Cheng-Ju Wu, Taipei, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/304 (2006.01); H01J 37/28 (2006.01); H01J 37/317 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); H01J 37/22 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3174 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); H01J 37/222 (2013.01); H01J 37/244 (2013.01); H01J 2237/20292 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/24475 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/31793 (2013.01);
Abstract

An electron beam drift detection device and a method for detecting electron beam drift are provided in which the method includes placing a predetermined characteristic identification pattern on a surface of a workpiece; emitting an electron beam, and focusing and deflecting the electron beam such that the focused and deflected electron beam scans the surface of the workpiece and the characteristic identification pattern; detecting backscattered electrons and secondary electrons; and receiving detection signals and performing an image process on the detection signals to obtain an electronic image of the characteristic identification pattern, and measuring a drift degree by comparing the electronic image with the predetermined shape of the characteristic identification pattern.


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