The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Jun. 03, 2013
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Woong-Kyu Son, Hwaseong-si, KR;
Hyo-Cheon Kang, Hwaseong-si, KR;
Deok-Yong Kim, Gunpo-si, KR;
Jae-Kwan Park, Suwon-si, KR;
Jeong-Ho Ahn, Hwaseong-si, KR;
Soo-Bok Chin, Seoul, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2006.01); G06T 7/40 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06T 7/0006 (2013.01); G06T 7/402 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20056 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Methods of analyzing photolithography processes are provided. The methods may include obtaining an image from a pattern formed on a wafer and obtaining dimensions of the image. The methods may further include converting the dimensions into a profile graph and then dividing the profile graph into a low-frequency band profile graph and a high-frequency band profile graph.