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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9164381 B1

PDFFull Text
Date of Patent:
Oct. 20, 2015

Filed:

May. 29, 2013

Resist composition, method of forming resist pattern, and compound

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Yoshitaka Komuro, Kawasaki, JP;

Shinji Kumada, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

John Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); C07C 303/32 (2006.01); C07C 309/04 (2006.01); C07C 309/06 (2006.01); C07C 309/12 (2006.01); C07C 69/616 (2006.01); C07C 69/635 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 69/616 (2013.01); C07C 69/635 (2013.01); C07C 303/32 (2013.01); C07C 309/04 (2013.01); C07C 309/06 (2013.01); C07C 309/12 (2013.01); G03F 7/38 (2013.01); G03F 7/0397 (2013.01);
Abstract

A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) which generates acid upon exposure, the acid generator component (B) including a sulfonium compound (B1) having a sulfonio group and an anion group represented by general formula (b1-r-1) shown below in one molecule thereof (wherein Yrepresents a divalent linking group or a single bond; Lrepresents an ester bond or a single bond; Vrepresents a divalent hydrocarbon group having a fluorine atom; and n represents 0 or 1, provided that, when Lrepresents a single bond, n=1).

Find Patent Forward Citations

Komuro, Yoshitaka. (2015). Resist composition, method of forming resist pattern, and compound (U.S. Patent No. 9164381). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9164381

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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