The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 13, 2015

Filed:

Jan. 28, 2014
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Hsieh-Hung Hsieh, Taipei, TW;

Yi-Hsuan Liu, Hualien, TW;

Chewn-Pu Jou, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03L 7/06 (2006.01); H03B 5/12 (2006.01); H01L 27/06 (2006.01); H01L 27/088 (2006.01); H01L 27/08 (2006.01); H01L 21/8234 (2006.01); H03L 7/099 (2006.01);
U.S. Cl.
CPC ...
H03B 5/1275 (2013.01); H01L 21/823431 (2013.01); H01L 21/823475 (2013.01); H01L 27/0629 (2013.01); H01L 27/0808 (2013.01); H01L 27/0886 (2013.01); H03L 7/0995 (2013.01);
Abstract

The present disclosure relates to a FinFET varactor circuit having one or more control elements that control a relationship between capacitance and voltage of a FinFET MOS varactor without introducing changes to process parameters used in fabrication of the FinFET MOS varactor. In some embodiments, the FinFET varactor circuit has a FinFET MOS varactor with a first terminal connected to a gate terminal of the FinFET MOS varactor and a second terminal connected to connected source and drain terminals of the FinFET MOS varactor. One or more control elements are connected to the first or second terminals of the FinFET MOS varactor and vary one or more operating characteristics of the FinFET MOS varactor. Using the control elements to vary the operating characteristics of the FinFET MOS varactor, allows for the characteristics to be adjusted without making changes to process parameters used in the fabrication of the FinFET MOS varactor.


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