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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9159573 B1

PDFFull Text
Expired
Date of Patent:
Oct. 13, 2015

Filed:

Dec. 18, 2013

Systems and methods for monitoring and controlling particle sizes in slurries

Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

I-Chen Chiang, Hsinchu, TW;

Yung-Long Chen, New Taipei, TW;

Chih-Chiang Tseng, Hsinchu County, TW;

Chi-Chan Yin, New Taipei, TW;

Assignee:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Attorney:

Jones Day

Primary Examiner:

Karen Kusumakar

Int. Cl.
CPC ...
H01L 21/44 (2006.01); E03B 1/00 (2006.01); F17D 1/00 (2006.01); F17D 3/00 (2006.01); F17D 1/16 (2006.01); F17D 1/18 (2006.01); B24B 1/00 (2006.01); B24B 7/19 (2006.01); B24B 7/30 (2006.01); H01L 21/306 (2006.01); B01F 11/00 (2006.01); B01F 15/00 (2006.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30625 (2013.01); B01F 11/0094 (2013.01); B01F 15/00129 (2013.01); B01F 15/00324 (2013.01); H01L 21/67075 (2013.01); H01L 21/67092 (2013.01); H01L 21/67155 (2013.01); H01L 22/10 (2013.01); B01F 2215/0045 (2013.01);
Abstract

Systems and methods are provided for preparing a plurality of slurry particles. The system includes: a tank configured to contain and provide the slurry particles, a sampling module configured to sample at least one slurry particle within the tank and obtain at least one parameter related to a particle size, and a controller coupled to the tank and the sampling module, configured to vibrate the slurry particles within the tank based on the at least one parameter.

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Chiang, I-Chen. (2015). Systems and methods for monitoring and controlling particle sizes in slurries (U.S. Patent No. 9159573). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9159573

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