The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Dec. 05, 2012
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03C 1/805 (2006.01); B32B 3/26 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01); G03F 7/11 (2006.01); G03F 7/38 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01); G03C 1/76 (2006.01);
U.S. Cl.
CPC ...
G03C 1/805 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0382 (2013.01); G03F 7/0757 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); B32B 3/266 (2013.01); G03C 2001/7635 (2013.01); Y10T 428/24331 (2015.01); Y10T 428/24612 (2015.01);
Abstract
A chemically amplified negative resist composition is provided comprising (A) a resin having a crosslinking group, (B) a crosslinker, (C) a photoacid generator capable of generating an acid upon exposure to light of wavelength 190-500 nm, (D) a solvent, and (E) a fluoroalkyl-containing amine compound. The resist composition can form a fine pattern, specifically a fine hole or space pattern which has a positive taper (or forward taper) profile in which the size of top is greater than the size of bottom or improves the overhang profile with extremely projected top.