The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Sep. 20, 2013
Applicant:
Arisawa Mfg. Co., Ltd., Niigata, JP;
Inventors:
Assignee:
ARISAWA MFG. CO., LTD., Niigata, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/13 (2006.01); G02B 27/42 (2006.01); G02B 5/30 (2006.01); G02B 27/46 (2006.01); B29D 11/00 (2006.01); G02F 1/13363 (2006.01);
U.S. Cl.
CPC ...
G02B 27/42 (2013.01); B29D 11/00634 (2013.01); G02B 5/3016 (2013.01); G02B 27/46 (2013.01); G02F 1/1313 (2013.01); G02F 2001/133635 (2013.01); G02F 2413/09 (2013.01);
Abstract
A light diffraction element comprising a transparent substrate and a first orientation layer that is formed on one surface of the substrate and includes anisotropic polymers and a first pattern of an orientation direction arranged periodically in a first direction along the primary plane of the substrate. The first pattern includes three or more small regions that are arranged in the first direction and in which the orientation direction of the polymers included in the first orientation layer are different from each other, and generates diffracted light as a result of interference between light passed respectively through the three or more small regions.