The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
Mar. 22, 2013
Applicant:
Siltronic Ag, Munich, DE;
Inventor:
Georg Brenninger, Oberbergkirchen, DE;
Assignee:
Siltronic AG, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); C23C 16/46 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68785 (2013.01); C23C 16/4584 (2013.01); C23C 16/4586 (2013.01); C23C 16/45502 (2013.01); C23C 16/466 (2013.01); H01L 21/0262 (2013.01); H01L 21/02381 (2013.01); H01L 21/02532 (2013.01); H01L 21/67253 (2013.01);
Abstract
Uniformity of vapor deposited coatings on semiconductor wafers is improved by employing an apparatus having a gas distributor head below a susceptor onto which the wafer is placed, the gas distributor head directing a fan of cooling gas at the rear side of the susceptor. The ratio of the diameter of the cooled section of the susceptor to the diameter D of the wafer is preferably from 0.1 to 0.4.