The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2015
Filed:
May. 23, 2014
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Petr Hlavenka, Brno, CZ;
Marek Uncovsky, Brno, CZ;
Assignee:
FEI Company, Hillsboro, OR (US);
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/04 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01); G01N 21/64 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/244 (2013.01); G01N 21/6447 (2013.01); H01J 37/224 (2013.01); H01J 37/226 (2013.01); H01J 37/28 (2013.01); G01N 2201/08 (2013.01); H01J 2237/2441 (2013.01); H01J 2237/2443 (2013.01); H01J 2237/2445 (2013.01); H01J 2237/26 (2013.01); H01J 2237/2605 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/31749 (2013.01);
Abstract
A method of investigating a sample using a charged-particle microscope is disclosed. By directing an imaging beam of charged particles at a sample, a resulting flux of output radiation is detected from the sample. At least a portion of the output radiation is examined using a detector, the detector comprising a Solid State Photo-Multiplier. The Solid State Photo-Multiplier is biased so that its gain is matched to the magnitude of output radiation flux.