The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2015
Filed:
Apr. 17, 2012
Michael Konrad Grobis, San Jose, CA (US);
Olav Hellwig, San Jose, CA (US);
Ernesto E. Marinero, Saratoga, CA (US);
Andrew Thomas Mccallum, San Jose, CA (US);
Dieter K. Weller, San Jose, CA (US);
Michael Konrad Grobis, San Jose, CA (US);
Olav Hellwig, San Jose, CA (US);
Ernesto E. Marinero, Saratoga, CA (US);
Andrew Thomas McCallum, San Jose, CA (US);
Dieter K. Weller, San Jose, CA (US);
HGST Netherlands B.V., Amsterdam, NL;
Abstract
A method for making a bit-patterned-media magnetic recording disk with discrete magnetic islands includes annealing the data islands after they have been formed by an etching process. A hard mask, such as a layer of silicon nitride or carbon, may be first formed on the recording layer and a patterned resist formed on the hard mask. The resist pattern is then transferred into the hard mask, which is used as the etch mask to etch the recording layer and form the discrete data islands. After the data islands are formed by the etching process, the patterned recording layer is annealed. The annealing may be done in a vacuum, or in an inert gas, like helium or argon, or in a forming gas such as a reducing atmosphere of argon plus hydrogen. The annealing improves the coercivity, the effective saturation magnetization and the thermal stability of the patterned media.