The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2015
Filed:
Aug. 06, 2012
Tomoyuki Fukuda, Takatsuki, JP;
Kosuke Shimizu, Takatsuki, JP;
Akihiro Ikeshita, Takatsuki, JP;
Rigaku Corporation, Tokyo, JP;
Abstract
An X-ray analyzing apparatus is such that a diffraction pattern, in which the intensity of secondary X-rays () is associated with the angle of rotation of a sample (S), is stored; while the pattern is scanned by a line of the secondary X-rays () intensity in a direction of highness and lowness, points on the pattern having not higher intensity than the line are taken as candidate points; respective angles of rotation of the candidate points, when the maximum value of the difference in angle of rotation between the neighboring candidate points attains a predetermined angle, are stored; depending on coordinates of a point of measurement, the angle of rotation proximate to the coordinates is read out from the stored angles; and the sample (S) is set to the read out angle and the point of measurement is arranged within the field of view (V) of a detector ().