The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Mar. 14, 2014
Applicant:

Transphorm Inc., Goleta, CA (US);

Inventors:

Yuvaraj Dora, Goleta, CA (US);

Yifeng Wu, Goleta, CA (US);

Assignee:

Transphorm Inc., Goleta, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/872 (2006.01); H01L 29/778 (2006.01); H01L 29/16 (2006.01); H01L 29/20 (2006.01); H01L 29/417 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/861 (2006.01); H01L 21/768 (2006.01); H01L 21/283 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 29/778 (2013.01); H01L 21/283 (2013.01); H01L 21/28581 (2013.01); H01L 21/76804 (2013.01); H01L 29/1608 (2013.01); H01L 29/2003 (2013.01); H01L 29/417 (2013.01); H01L 29/42316 (2013.01); H01L 29/6606 (2013.01); H01L 29/6609 (2013.01); H01L 29/66068 (2013.01); H01L 29/66462 (2013.01); H01L 29/7787 (2013.01); H01L 29/861 (2013.01);
Abstract

A III-N semiconductor device can include an electrode-defining layer having a thickness on a surface of a III-N material structure. The electrode-defining layer has a recess with a sidewall, the sidewall comprising a plurality of steps. A portion of the recess distal from the III-N material structure has a first width, and a portion of the recess proximal to the III-N material structure has a second width, the first width being larger than the second width. An electrode is in the recess, the electrode including an extending portion over the sidewall of the recess. A portion of the electrode-defining layer is between the extending portion and the III-N material structure. The sidewall forms an effective angle of about 40 degrees or less relative to the surface of the III-N material structure.


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